Solder Resist Stripping and Cleaning Line
    • Solder Resist Stripping and Cleaning Line

    Solder Resist Stripping and Cleaning Line

    This horizontal pass-through system is engineered for the efficient removal of protective ink and PVD (Physical Vapor Deposition) coatings. It features an integrated cleaning function, eliminating the need for traditional racking or framing operations. Additionally, the system incorporates an automatic membrane residue collection mechanism, ensuring a clean and streamlined process. Designed to handle high-temperature applications, it can operate at temperatures up to 120°C, making it suitable for a wide range of industrial processes.


    This horizontal pass-through system is engineered for the efficient removal of protective ink and PVD (Physical Vapor Deposition) coatings. It features an integrated cleaning function, eliminating the need for traditional racking or framing operations. Additionally, the system incorporates an automatic membrane residue collection mechanism, ensuring a clean and streamlined process. Designed to handle high-temperature applications, it can operate at temperatures up to 120°C, making it suitable for a wide range of industrial processes.

    Procedure

    Load → Rinse → Air knife → Stripping plating→ Air knife → Stripping plating → Rinse → Air knife  → Scrubbing with detergent → Scrubbing with DI water → DI water rinse → Air knife drying → Unload


     Membrane Residue Filtration System 1

    - Efficient Residue Handling: Membrane residue is collected within a rotating drum, where it is subjected to air cutting and spray washing. This process effectively separates the residue, which then drops into Collection Basket 1 for easy disposal.


     Membrane Residue Filtration System 2

    - Convenient Maintenance: Collection Basket 1 is designed for easy access and can be directly removed from the front side of the liquid tank, simplifying the cleaning process and reducing downtime.


     Water Jet System

    - Uniform Spraying: The system ensures consistent and even water distribution, leading to highly effective membrane removal and improved processing results.


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